Nanoscale Patterning by Nano Imprint Lithography

Main Researcher: Stijn Scheerlinck

Patterning on the nanoscale is an ongoing challenge in the broad field of photonics. Both for nanophotonic telecom devices as well as for compact optical sensors, it is necessary to fabricate structures on a scale much smaller than the wavelength of light. However, conventional techniques such as e-beam lithography or UV-lithography are either too slow, too expensive or do not attain the level of resolution and accuracy that is needed.

Nano Imprint Lithography however is a powerful technique for rapid and cheap patterning on a scale much smaller than the wavelength of light over large areas. In our Clean Room facilities we have been developing a UV-based Nano Imprint Lithography process used for fabrication of high resolution gratings and photonic structures.

UV-based Nano Imprint Lithography

In contrast to conventional Nano Imprint techniques, UV-based Nano Imprint Lithography offers a lot of advantages. It is a room temperature process and the applied pressures are very low, in the order of only 1 bar. Moreover, transparant molds offer the possibility for precision alignment.

Template and imprint in PAK-01 (Toyo Gosei) with a cross section detail

Other people involved:

• Stijn Scheerlinck

Related Research Projects

• IST: ePIXnet (European Network of Excellence on Photonic Integrated Components and Circuits)

Downloads

Fabrication of PSQ-L polymer photonic devices

PhD thesises

• Stijn Scheerlinck, Koppelen naar en proben van nanofotonische circuits met metaalroosters, Metal Grating Based Interfacing to and Probing of Nanophotonic Circuits, (1/2009)  
• Jie Teng, Fabrication of PSQ-L polymer photonic devices, (1/2010)  

Patents

• S. Scheerlinck, D. Van Thourhout, R. Baets, Waveguide coupling probe and methods for manufacturing same

Publications

International Journals


1. U. Plachetka, A. Kristensen, S. Scheerlinck, N. Whitbread, J. Huskens, N. Koo, H. Kurz, Fabrication of Photonic Components by Nanoimprint Technology within ePIXnet, Microelectronic Engineering, 85(5-6), p.886-889 doi:10.1016/j.mee.2008.01.013 (2008)  .
2. S. Scheerlinck, D. Taillaert, D. Van Thourhout, R. Baets, Flexible metal grating based optical fiber probe for photonic integrated circuits, Applied Physics Letters, 92(3), p.031104 doi:10.1063/1.2827589 (2008)  .
3. S. Scheerlinck, J. Schrauwen, F. Van Laere, D. Taillaert, D. Van Thourhout, R. Baets, Efficient, broadband and compact metal grating couplers for silicon-on-insulator waveguides, Optics Express, 15, p.9639-9644 doi:10.1109/cleo.2007.4452981 (2007)  .

International Conferences


1. J. Teng, H. Yan, L. Li, M. Zhao, H. Zhang, G. Morthier, Fabrication of High-Q Polymer Microring Resonators for Bio-sensing Applications, MWP 2011, (2011).
2. S. Scheerlinck, R.H. Pedersen, P. Dumon, W. Bogaerts, U. Plachetka, D. Van Thourhout, R. Baets, A. Kristensen, Fabrication of Nanophotonic Circuit Components by Thermal Nano Imprint Lithography, CLEO/QELS 2008, United States, p.CFO2 doi:10.1109/cleo.2008.4551024 (2008)  .
3. U. Plachetka, A. Kristensen, S. Scheerlinck, N. Whitbread, J. Huskens, N. I. Koo, H. Kurz, Fabrication of photonic components by nanoimprint technology within ePIXnet, MNE 2007, Denmark, (2007)  .
4. S. Scheerlinck, D. Van Thourhout, R. Baets, UV-based Nano Imprint Fabrication of Gold Grating Couplers on Silicon-on-Insulator, 2007 Digest of the IEEE/LEOS Summer Topicals Meetings, United States, p.MB3.4 doi:10.1109/leosst.2007.4288342 (2007)  .
5. S. Scheerlinck, J. Schrauwen, F. Van Laere, D. Van Thourhout, R. Baets, Metal grating coupler for Silicon-on-Insulator, Annual Workshop of the IEEE/LEOS Benelux Student Chapter, Netherlands, p.17 (2007)  .
6. S. Scheerlinck, D. Van Thourhout, R. Baets, UV-NIL with a DUV-fabricated silicon template as a flexible tool for nanopatterning, Micro- and Nano-Engineering 2006, 32nd International Conference, MNE 2006, Spain, p.121-122 (2006)  .
7. S. Scheerlinck, D. Van Thourhout, R. Baets, Nano imprint lithography for photonic structure patterning, Proceedings Symposium IEEE/LEOS Benelux Chapter, Belgium, p.63-66 (2005)  .
8. S. Scheerlinck, D. Van Thourhout, R. Baets, Replication of SOI Photonic Structures by Nano-Imprintlithography, IEEE/LEOS Benelux Chapter, Workshop on Photonic Materials and Technology, Netherlands, p.16 (2004).

National Conferences


1. S. Scheerlinck, Replication of submicron structures by nano-imprintlithography, 5th FTW PHD Symposium, Interactive poster session, paper nr. 17 (proceedings available on CD-Rom) , Belgium, (2004).

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