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Authors: S. Scheerlinck, R.H. Pedersen, P. Dumon, W. Bogaerts, U. Plachetka, D. Van Thourhout, R. Baets, A. Kristensen
Title: Fabrication of Nanophotonic Circuit Components by Thermal Nano Imprint Lithography
Format: International Conference Presentation
Publication date: 5/2008
Journal/Conference/Book: CLEO/QELS 2008
Volume(Issue): p.CFO2
Location: San Jose, United States
Internal Reference: [N-700]
Download: Download this Publication (398KB) (398KB)

Abstract

Nanophotonic components are fabricated using thermal nano imprint lithography (NIL). A silicon-on-insulator Mach-Zehnder interferometer with 20 dB extinction ratio is demonstrated. Grating couplers fabricated by a two-step imprint process demonstrate over 14% coupling efficiency.

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