| Authors: | T. Vandekerckhove, R. Van Assche, I. Tanghe, M. Niels, S. Poelman, T. Vanackere, M. Billet, S. Clemmen, B. Kuyken | | Title: | Highly-Selective Etching of Micro-Transfer-Printed Thin-Film Lithium Niobate for Low Coupling Losses | | Format: | International Conference Proceedings | | Publication date: | 5/2024 | | Journal/Conference/Book: | CLEO 2024, Technical Digest Series (Optica Publishing Group, 2024)
| | Volume(Issue): | p.paper STh3F.6 (2 pages) | | Location: | Charlotte, NC, United States | | DOI: | 10.1364/CLEO_SI.2024.STh3F.6 | | Citations: | 2 (Dimensions.ai - last update: 21/12/2025)
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Abstract
Efficient low-loss coupling to micro-transfer-printed lithium niobate remains
a challenge. We developed a highly-selective lithium niobate etch that enables selective
etching of tapered coupling structures into the lithium niobate thin film after micro-transfer
printing. Related Research Topics
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