Authors: | W. Bogaerts, P. Dumon, J. Van Campenhout, V. Wiaux, J. Wouters, S. Beckx, D. Taillaert, B. Luyssaert, D. Van Thourhout, R. Baets | Title: | Deep UV Lithography for Planar Photonic Crystal Structures | Format: | International Conference Proceedings | Publication date: | 10/2003 | Journal/Conference/Book: | LEOS 2003
(invited)
| Volume(Issue): | 2 p.754-755 | Location: | Tuscon, United States | DOI: | 10.1109/leos.2003.1253020 | Citations: | 2 (Dimensions.ai - last update: 8/12/2024) Look up on Google Scholar
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Abstract
WE demonstrate deep UV lithography at 248nm to be useful fabrication tool for nanophotonics, including photonic crystals, operating at telecom wavelengths. The structures are of high quality, and first results show low propagation losses. |
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