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Authors: G. Murdoch, A. Milenin, C. Delveauz, P. Ong, S. Pathak, D. Vermeulen, G. Sterckx, G. Winroth, P. Verheyen, G. Lepage, W. Bogaerts, R. Baets, J. Van Campenhout, P. Absil
Title: Advanced 300-mm waferscale patterning for silicon photonics devices with record low loss and phase errors
Format: International Conference Proceedings
Publication date: 7/2012
Journal/Conference/Book: the 17th OpeoElectronics and Communications Conference
Volume(Issue): p.15-16
Location: Busan, South Korea
Download: Download this Publication (147KB) (147KB)

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