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Authors: P.I. Borel, L.H. Frandsen, A. Harpoeth, J.B. Leon, H. Liu, M. Kristensen, W. Bogaerts, P. Dumon, R. Baets, V. Wiaux, S. Beckx, J. Wouters
Title: Bandwidth engineering of photonic crystal waveguide bends
Format: International Journal
Publication date: 10/2004
Journal/Conference/Book: Electronics Letters
Volume(Issue): 40(20) p.1263-1264
Internal Reference: [N-327]
Download: Download this Publication (306KB) (306KB)

Abstract

An effective design principle has been applied to photonic crystal waveguide bends fabricated in Silicon-on-insulator material using deep UV lithography resulting in a large increase in the low-loss bandwidth of the bends. Furthermore, it is experimentally demonstrated that the absolute bandwidth range can be adjusted in a post-fabrication thermal oxidation process.

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