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Authors: Y.X. Zhuang, L.H. Frandsen, A. Harp√łth, M. Thorhauge, M. Kristensen, P.I. Borel, W. Bogaerts, R. Baets
Title: Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography
Format: International Conference Proceedings
Publication date: 2/2004
Journal/Conference/Book: OFC 2004
Volume(Issue): p.ThR2
Location: Los Angeles, United States
Internal Reference: [N-294]

Abstract

Wavelength tuning of characteristic features of straight photonic crystal waveguides has been obtained by varying the exposure dose in deep UV lithography. The experimental results agree very well with numerical simulations

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