Authors:	W. Bogaerts, P. Dumon, J. Van Campenhout, V. Wiaux, J. Wouters, S. Beckx, D. Taillaert, B. Luyssaert, D. Van Thourhout, R. Baets
Title:	Deep UV Lithography for Planar Photonic Crystal Structures
Format:	International Conference Proceedings
Publication date:	10/2003
Journal/Conference/Book:	LEOS 2003 (invited)
Volume(Issue):	2 p.754-755
Location:	Tuscon, United States
DOI:	10.1109/leos.2003.1253020
Citations:	1 (Dimensions.ai - last update: 14/4/2024) Look up on Google Scholar
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Abstract

WE demonstrate deep UV lithography at 248nm to be useful fabrication tool for nanophotonics, including photonic crystals, operating at telecom wavelengths. The structures are of high quality, and first results show low propagation losses.