| Authors: | A. Djuphammer, P. Edinger, C. Antony, S. Janssen, W. Bogaerts, K.B. Gylfason | | Title: | Leveraging a Nonvolatile MEMS Switch for Sub-Lithography Silicon Photonics | | Format: | International Conference Proceedings | | Publication date: | 3/2026 | | Journal/Conference/Book: | Optical Fiber Communication Conference
| | Volume(Issue): | p.Th2A.7 | | Location: | Los Angeles, United States | | Online: | https://opg.optica.org/abstract.cfm?uri=OFC-2026-Th2A.7 | | Citations: | Look up on Google Scholar
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Abstract
Silicon photonics is accelerating high-performance computing, and integrated MEMS devices offer low-power reconfiguration. However, MEMS device performance is limited by lithography resolution. Here, we unveil a post-fabrication technique to reduce a photonic foundry-defined 230 nm starting gap to 50 nm, using a nonvolatile MEMS switch. Related Research Topics
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