| Authors: | Yosuke Shimura, A. Srinivasan, D. Van Thourhout, Rik Van Deun, M. Pantouvaki, J. Van Campenhout, Roger Loo | | Title: | Low temperature in-situ P-doped Ge epitaxy using Ge2H6 in view of optical applications | | Format: | International Conference Proceedings | | Publication date: | 5/2015 | | Journal/Conference/Book: | The 9th International Conference On Silicon Epitaxy And Heterostructures
| | Volume(Issue): | p.91-92 | | Location: | Montreal, Canada | | Citations: | Look up on Google Scholar
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