Authors:	K. Welna, K. Debnath, P. Dumon, A. Khanna, T.F. Krauss, L. O'Faolain
Title:	High Q Photonic Crystal Cavities realised using Deep Ultraviolet Lithography
Format:	International Conference Proceedings
Publication date:	8/2014
Journal/Conference/Book:	Group IV Photonics
Volume(Issue):	p.161-162
Location:	Paris, France
DOI:	10.1109/group4.2014.6961997
Citations:	1 (Dimensions.ai - last update: 21/12/2025) Look up on Google Scholar
Download:	(567KB)

Abstract

Deep Ultraviolet Lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realization of high Q factor optical resonators. Here, we demonstrate Q-factor values of approx. 200,000 using an optimized design.