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Authors: S. Pathak, M. Vanslembrouck, P. Dumon, D. Van Thourhout, W. Bogaerts
Title: Effect of mask grid on SOI arrayed waveguide grating performance
Format: International Conference Proceedings
Publication date: 8/2013
Journal/Conference/Book: Group IV Photonics
Editor/Publisher: IEEE, 
Volume(Issue): p.WC7
Location: Seoul, South Korea
DOI: 10.1109/group4.2013.6644475
Citations: 3 ( - last update: 7/7/2024)
3 (OpenCitations - last update: 10/5/2024)
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We studied the impact of the lithography mask grid
on the performance of silicon AWGs, and show a dramatic
improvement in crosstalk of 5dB when going from a 5nm to
a 1nm grid.

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