Authors: | H. Yu, M. Pantouvaki, J. Van Campenhout, D. Korn, K. Komorowska, P. Dumon, Y. Li, P. Verheyen, P. Absil, L. Alloatti, D. Hillerkuss, J. Leuthold, R. Baets, W. Bogaerts | Title: | Performance tradeoff between lateral and interdigitated doping patterns for high speed carrier-depletion based silicon modulators | Format: | International Journal | Publication date: | 6/2012 | Journal/Conference/Book: | Optics express
| Volume(Issue): | 20(12) p.12926-12938 | DOI: | 10.1364/oe.20.012926 | Citations: | 110 (Dimensions.ai - last update: 8/12/2024) 71 (OpenCitations - last update: 10/5/2024) Look up on Google Scholar
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Abstract
Carrier-depletion based silicon modulators with lateral and interdigitated PN junctions are compared systematically on the same fabrication platform. The interdigitated diode is shown to outperform the lateral diode in achieving a low VðLð of 0.62 V∙cm with comparable propagation loss at the expense of a higher depletion capacitance. The low VðLð of the interdigitated PN junction is employed to demonstrate 10 Gbit/s modulation with 7.5 dB extinction ration from a 500 µm long device whose static insertion loss is 2.8 dB. In addition, a traveling wave electrode co-designed with the lateral diode is demonstrated for up to 40 Gbit/s from a 3 mm long device. Related Research Topics
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