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Authors: M. Verbist, D. Van Thourhout
Title: Focused ion beam etching of thin diamond layers
Format: International Conference Proceedings
Publication date: 11/2009
Journal/Conference/Book: Proceedings of the 2009 Annual Symposium of the IEEE Photonics Benelux Chapter
Volume(Issue): p.113-116
Location: Brussels, Belgium
Citations: Look up on Google Scholar
Download: Download this Publication (297KB) (297KB)


Diamond, with its wide range of extreme properties, is an ideal candidate for many optical applications. Since it has become possible to grow thin layers of diamond on various substrates, the challenge of structuring these layers remains, due to the extensive chemical inertness and mechanical hardness of diamond. Focused ion beam (FIB) etching offers the opportunity to fabricate structures at a very small scale with a very short development cycle.

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