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Authors: S. Scheerlinck, R.H. Pedersen, P. Dumon, W. Bogaerts, U. Plachetka, D. Van Thourhout, R. Baets, A. Kristensen
Title: Fabrication of Nanophotonic Circuit Components by Thermal Nano Imprint Lithography
Format: International Conference Presentation
Publication date: 5/2008
Journal/Conference/Book: CLEO/QELS 2008
Volume(Issue): p.CFO2
Location: San Jose, United States
DOI: 10.1109/cleo.2008.4551024
Citations: 3 ( - last update: 14/7/2024)
1 (OpenCitations - last update: 3/5/2024)
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Nanophotonic components are fabricated using thermal nano imprint lithography (NIL). A silicon-on-insulator Mach-Zehnder interferometer with 20 dB extinction ratio is demonstrated. Grating couplers fabricated by a two-step imprint process demonstrate over 14% coupling efficiency.

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