| Authors: | Y. Liu, U. Khan, W. Bogaerts | | Title: | Fabrication Tolerant Directional Coupler | | Format: | International Conference Poster | | Publication date: | 5/2023 | | Journal/Conference/Book: | European Conference on Integrated Optics
| | Location: | Twente, Netherlands | | Citations: | Look up on Google Scholar
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Abstract
We present the design of a fabrication-tolerant directional coupler in a passive photonic integrated chip fabricated on Imec's iSiPP50G silicon photonics platform. Based on Finite Difference Eigenmode, Finite-Difference Time-Domain simulations, and experimental measurements. We demonstrate that such a design is tolerant to waveguide width fabrication errors. The experimental results are in good agreement with the simulations. Related Research Topics
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