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Authors: J. Schrauwen, G. Roelkens, D. Van Thourhout, R. Baets
Title: Focused-ion-beam lithography for prototyping of silicon photonic compontnets
Format: International Conference Poster
Publication date: 5/2008
Journal/Conference/Book: EIPBN
Location: United States
Internal Reference: [N-744]
Download: Download this Publication (442KB) (442KB)

Abstract

We propose a technique for rapid prototyping of novel silicon nanophotonic device concepts with feature sizes as small as 100 nm. It is based on focused-ion-beam lithography on a metallic/ceramic layer stack and pattern transformation into the silicon by Inductively Coupled Plasma etching.

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