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Authors: H. Desmet, K. Neyts, R. Baets
Title: Liquid crystal orientation on patterns etched in silicon-on-insulator
Format: International Conference Proceedings
Publication date: 4/2006
Journal/Conference/Book: Integrated Optics, Silicon Photonics, and Photonic Integrated Circuits
Editor/Publisher: SPIE, 
Volume(Issue): 6183 p.61831Z
Location: Strasbourg, France
Internal Reference: [N-494]
Download: Download this Publication (651KB) (651KB)

Abstract

Liquid Crystals have many applications in photonics, but often the geometrical properties of the photonic structures give problems for controlling the alignment of the liquid crystal. We demonstrate the effect on the orientation of a nematic liquid crystal by structures etched in Silicon-on-Insulator (SOI) wafers, produced by photolithography. We characterize the alignment effect of several patterns, including configurations that allow multiple stable director orientations. Also, the influence of a surface treatment (like deposition of a monolayer on the structured surface) is discussed.

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